Airborne Molecular Contamination and Surface Molecular Contamination
We provide technical expertise in identifying and controlling Airborne Molecular Contamination (AMC) and Surface Molecular Contamination (SMC) for improving process and product yields for semiconductor, photovoltaic, LED, lasers, optoelectronics, disk drives, and other contamination-sensitive industries.
Sample Types
- Cleanroom air
- Clean dry air (CDA)
- Ultrapure nitrogen (HPN2)
- Silicon wafers
- Clean benches
- Tool cabinets
- Flooring
- Electrostatic chucks
- Tool stages
Analyses and Services Provided
Analyses
- Trace metals
- Dopants (B,P, As, Sb)
- Acids and bases (including ammonium, amines, urea, SOx)
- Organics, including refractory organics
- Other special tests as need when fabs have new or unique technologies (failure analysis, leaches of hazed optics, particle ID, wipe studies…
Services
- Baselining via grab sampling in critical process and manufacturing areas
- Trouble shooting and resolving contamination escalations
Techniques
Sampling
- Witness wafers – organic and metal free
- Bubbler / impinger method
- Organic adsorption sampler
Analytical
- Inductively coupled plasma mass spectrometry (ICP-MS)
- Ion chromatography (IC)
- Ion chromatography mass spectrometry (IC-MS)
- Thermal desorption gas chromatography - mass spectrometry (TD GC-MS)
- Full wafer TD GC-MS
Lithography Concerns
Balazs™ is a qualified laboratory for leading OEMs. Our collaboration has led to improved specifications for optimizing optics performance and stepper environment control thereby extending the lifetime of the tool.
Selective Issues
- AMC can form hazing (surface contamination) on optics
- NH3 is typically present at “high” concentrations in lithography areas
- Presence of Cl- or SOx can deposit on optics
- Silicon-containing materials can outgas and leave SiO2 on optics
Recommended Tests
- AMC in stepper (before and after filters)
- AMC in room
- N2, CDA testing (before and after purifiers)
- Mask, wafer and other storage area (compacts and stockers)
- Wafers or substrates exposed to FOUP’s, Pods, compacts, shippers
Industry Guidelines
- ITRS (InternationalTechnology Roadmap for Semiconductors)
- SEMI F21-1102 analysis for molecular acids, bases, condensable organics and dopants.
- IEST-RP-CC035.0, Design Considerations for Airborne Molecular Contamination Filtration Systems in Cleanrooms and Controlled Environments
- ISO 16444-8
Application Notes
SEMI F21-1102 analysis for molecular acids, bases, condensable organics and dopants. | |
---|---|
IEST-RP-CC035.0, Design Considerations for Airborne Molecular Contamination Filtration Systems in Cleanrooms and Controlled Environments | |
APP0354 Cleanroom Air Monitoring | |
APP0355 Cleanroom SEMI F21-1102 Specification | |
APP0356 Particle Counts in Ultra Pure Water | |
APP0369 Bases in Air and Ultrahigh Purity Gases | |
APP0384 Qualification of Lithography Tools | |
APP0452 IEST Working Group and Recommended Practice Support | |
APP0458 Gas Chromatography for Organic Testing |
Interested in our airborne and surface molecular contamination identification services?
From straightforward compressed gas analysis, to air sampling and customized wet-chemical digestion schemes, our world-leading resources are the perfect fit for your unique needs.