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May 5-7	Semicon Singapore
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Wafer Desorber

Characterizing Challenging Thin-Films and Advanced Materials

-Including GD-OES as Part of Your Analysis Program

This article summarizes the use and advantages of using Glow Discharge Optical Emission Spectroscopy (GD-OES) as part of an overall analysis program for advanced materials (i.e. hafnium and zirconium precursors) and any other thin-films. Other equipment and techniques such as Laser Ablation IC-PMS and SIMS provide complimentary data to provide a comprehensive analytical report of a sample.

GD-OES provides fast, simultaneous analysis of all elements of interest including carbon, nitrogen, oxygen, hydrogen and chlorine. It is an ideal tool for thin film characterization, contamination identification and depth profiling. Accommodating fragile samples using an RF plasma source operating in pulse mode, use of GD-OES is ideal for semiconductor and other high-tech industries.

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IEST Working Group and Recommended Practice Support
-Is Your Operation Keeping Up with Industry Standards?
Many industries look to external technical societies or standards developing organizations, such as the Institute of Environmental Sciences and Technology (IEST), in order to optimize their operations, drive technological growth, and ensure continued improvement for an entire industry segment. Groups like the IEST manage the technical Working Groups that generate the peer-created and peer-approved standards and solicit input from industry experts on an ongoing basis.

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Hot Topics

AMC and UPW Guidelines

Updates to the guidelines are complete

and available for download

The guidelines incorporate industry oversight recommendations,

methods used and identification of critical areas of concern. The

new guidelines are re-formatted, making information easier to

locate and reference. Balazs makes these guidelines available

to the industry free of charge. Download your copy!

Go To Download Page

Advances in Real-Time Airborne Molecular Contamination Monitoring

The semiconductor industry is moving toward data on demand to monitor the levels of cleanroom contaminants. No single (or simple combination of) instrument(s) is available today that is sufficiently sensitive, absolutely selective and reliable to meet the requirements and provide the required online monitoring of all desired airborne molecular contamination (AMC) present in semiconductor fabs. However, on-line monitors...