Log-In to FabNet Contact

Instrumentation


High-Resolution ICP-MS

 



Search Coming Soon

GENERAL INFORMATION

Balazs Analytical Services

Analysis by ICP-MS

Benefits of Baselines

Contamination Recovery Support Program

International Client Services

Disk Drive Industry Services

Power Industry Services

Pharmaceutical, Medical Device and Life Sciences Industries

Microcontamination Identification

Incident Recovery Services

Consulting Services

Equipment List in Fremont

Equipment List in New York

Gas Analysis

Vacuum Technology Analyses

 

WATER TESTING 

Water Testing Services

Ultrapure Water Analysis

Source Water Analysis

Particle Counts in Ultrapure Water

 

CHEMICAL TESTING

Trace Elements in Chemicals by ICP-MS

Chemicals and Materials Analysis

CMP Slurry Characterization

Cu Plating Bath Characterization

Cu Spec-257, On-line Corrosion Inhibitor Analyzer

Pure Liquid Sampler

High Performance Material Evaluation

ChemPulse Slurry Characterization

 

CLEANROOM AIR

Cleanroom Air Monitoring

Organic Outgas Analysis

Organics in Air and on Wafers

Analysis of Amines in Air

SEMI F21-1102

Cu Cross Contamination Analysis

 

COMPONENT TESTING & MATERIALS EVALUATION

Materials Evaluation

RoHS Testing

Organic Outgassing

Solid Material Evaluation by SARIS

Static Leach

Dynamic Leach

Wet Bench Material Qualification

Material Organic Identification

 

THIN FILM TESTING

Thin Film Analysis

Thin Film Techniques of Analysis

Trace Impurities in Cu Films

Native Oxide Measurement

Non-Destructive Analysis of 300mm Wafers

 

CONTAMINATION ID- WAFER TESTING

Cu Cross Contamination Analysis

Wafer Analysis by VPD ICP-MS and TXRF

Organics in Air and on Wafers
 

SITE MAP FAQ  LEGAL NOTICE © Copyright AIR LIQUIDE 2006