Documentation Library [ Return to References ]
New Contamination Monitoring Applications Available with Automated VPD ICP-MS
Analytical Insight, 2009
Don’t Forget the Edge! Significance of VPD ICP-MS Edge Exclusion
Annie Watts, Carolyn Vercell
Analytical Insight, 2007
An Alternative Dopant-measurement Method for Analyzing ULE Implant
Fuhe Li, Scott Anderson
Solid State Technology, 2006
Optimizing the Selection an Supply of Hf Precursor Candidates for Gate Oxide
A. Soulet, L. Duquesne, G. Jursich, R. Inman, A. Misra, N. Blasco, C. Lachaud, Y. Marot, R. Prunier, M. Vautier, S. Anderson, P. Clancy, M. Havlicek
Semiconductor Fabtech, 2005
Effects of Ambient and Dissolved Oxygen Concentration in Ultra Pure Water on Initial Growth of Native Oxide on a Silicon <100> Surface
Fuhe Li, Marjorie Balazs, Scott Anderson
Journal of Electrochemical Society, 2005
Dose Quantification for Ultra Low Energy (ULE) Shallow Implants by SARISTM Laser Ablation ICP Mass Spectrometry
Fuhe Li, Scott Anderson
International Conference on Ion Implantation Technology, 2004
Using Direct Solid Sampling ICP Mass Spectrometry to Complement SEM-EDX and SIMS in Characterizing Semiconductor Materials
Fuhe Li, Scott Anderson
Characterization and Metrology for ULSI, 2003
High Resolution ICP-MS Study on the Effects of the Ambient Conditions of Native Oxide Growth Kinetics for a Silicon <100> Surface
Fuhe Li, Marjorie Balazs, Scott Anderson
Winter Conference on Plasma Spectrochemistry, 2002
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