Airborne and Surface Molecular Contamination Identification [ Return to Products & Services ]

Balazs NanoAnalysis provides technical expertise in identifying and controlling Airborne Molecular Contamination (AMC) and Surface Molecular Contamination (SMC) for improving process and product yields for semiconductor, photovoltaic, LED, lasers, optoelectronics, disk drives, and other contamination-sensitive industries.

How Can We Help?

Accreditations

Sample Types

Cleanroom air
Clean dry air (CDA)
Ultrapure nitrogen (HPN₂)
Silicon wafers
Clean benches
Tool cabinets
Flooring
Electrostatic chucks
Tool stages

Analyses and Services Provided

Analyses

Trace metals
Dopants (B,P, As, Sb)
Acids and bases (including ammonium, amines, urea, SOx)
Organics, including refractory organics
Other special tests as need when fabs have new or unique technologies (failure analysis, leaches of hazed optics, particle ID, wipe studies… )

Services

Baselining via grab sampling in critical process and manufacturing areas
Trouble shooting and resolving contamination escalations

Techniques

Sampling

Witness wafers – organic and metal free
Bubbler / impinger method
Organic adsorption sampler

Analytical

Inductively coupled plasma mass spectrometry (ICP-MS)
Ion chromatography (IC)
Ion chromatography mass spectrometry (IC-MS)
Thermal desorption gas chromatography - mass spectrometry (TD GC-MS)
Full wafer TD GC-MS

Lithography Concerns

Balazs is a qualified laboratory for leading OEMs. Our collaboration has led to improved specifications for optimizing optics performance and stepper environment control thereby extending the lifetime of the tool.

Selective Issues

AMC can form hazing (surface contamination) on optics
NH₃ is typically present at “high” concentrations in lithography areas
Presence of Cl^- or SO_xcan deposit on optics
Silicon-containing materials can outgas and leave SiO₂ on optics

Recommended Tests

AMC in stepper (before and after filters)
AMC in room
N₂, CDA testing (before and after purifiers)
Mask, wafer and other storage area (compacts and stockers)
Wafers or substrates exposed to FOUP’s, Pods, compacts, shippers

Industry Guidelines

ITRS (InternationalTechnology Roadmap for Semiconductors)
SEMI F21-1102 analysis for molecular acids, bases, condensable organics and dopants.
IEST-RP-CC035.0, Design Considerations for Airborne Molecular Contamination Filtration Systems in Cleanrooms and Controlled Environments
ISO 16444-8