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Fall 2013

New Method for Ultralow level Total and Colloidal Silica Analysis in Ultrapure Water (UPW) / Using VPD for Unique Problem Solving in the Semiconductor Fab /  Air Liquide Electronics US participated in SEMICON West 2013

Summer 2013

Wipe Analysis to Determine Metal Contamination on Critical Surfaces - Latest Advances and Innovative Solutions for High-Purity Gas and Cleanroom Air Sampling - Analysis of Non-Volatile Inorganic Compounds using High-Purity Performance Liquid Chromatography

Spring 2013

AFM Nano-Scale Surface Roughness Monitoring - BalazsTM Certified Packaging Bags - Cleanliness Monitoring of PODs, FOUPs, FOSB and Cassettes

Fall 2012

 Sampling Air for Contamination; Are Your 450 mm Wafers Clean? - Analytical Characterization for the Next Generation of Wafers; Comprehensive Analyses to Ensure Optimal Integrity of Anodized Coatings

Summer 2012

 Rapid on-site wipe testing to determine surface metallic contamination on critical surfaces; Clean operation manufacturing; Purity analysis of UHP dopant materials by ICP-MS

Winter 2011

Balazs Contribution to UltraPure Water Challenges; Impurities and Ingredients Analysis of Wet Process Materials and Process Baths to Meet Challenges of Semiconductor Manufacturing; Measurement and Reduction of Greenhouse Gas Emissions of Process Tools

Summer 2010

Elemental Speciation and its Application to RoHS and REACH Studies; A Novel Approach to SiC Material Characterization; Reaccreditation for ISO/IEC 17025:2005

Winter 2010

Photovoltaic (PV) Industry Growth Updates: High Purity Water (HPW) Risk Management Through Standardization; Production Ramp-Up for Maximum Yield; Semiconductor and Photovoltaic Film Characterization by Laser Ablation ICP-MS and ICP-OES (Webinar)

Fall 2009

UPW Sampling Valves: Minimizing Contamination for State-of-the-Art Sample; Comparison of Solar-Grade Silicon Analytical Methods for Metallic Contamination

Summer 2009

Evaluation of Impurities in High-K and Low-K Thin Films Produced from Advanced Precursor Materials; New Contamination Monitoring Applications Available with Automated VPD ICP-MS

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